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Shubu Mukherjee's Architecture Design for Soft Errors PDF

By Shubu Mukherjee

ISBN-10: 0080558321

ISBN-13: 9780080558325

ISBN-10: 0123695295

ISBN-13: 9780123695291

This publication offers a accomplished description of the architetural innovations to take on the tender blunders challenge. It covers the recent methodologies for quantitative research of sentimental error in addition to novel, comparatively cheap architectural ideas to mitigate them. to supply readers with a greater grab of the wider challenge deffinition and answer area, this booklet additionally delves into the physics of sentimental mistakes and reports present circuit and software program mitigation suggestions. desk OF CONTENTS bankruptcy 1: advent bankruptcy 2: equipment- and Circuit-Level Modeling, dimension, and Mitigation bankruptcy three: Architectural Vulnerability research bankruptcy four: complex Architectural Vulnerability research bankruptcy five: mistakes Coding concepts bankruptcy 6: Fault Detection through Redundant Execution bankruptcy 7: blunders restoration bankruptcy eight: software program Detection and restoration * offers the methodologies essential to quantify the impact of radiation-induced tender error in addition to state of the art concepts to guard opposed to them

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Please refer to Strathis [22] for an in-depth discussion of this subject. Hot Carrier Injection HCI results in a degradation of the maximum operating frequency of the silicon chip. HCI arises from impact ionization when electrons in the channel strike the silicon atoms around the drain–substrate interface. This could happen from one of several conditions, such as higher power supply, short channel lengths, poor oxide interface, or accidental overvoltage in the power rails. The ionization produces electron–hole pairs in the drain.

Nevertheless, its neutron flux is only about half of that 4 Terrestrial neutrons have two other peaks below the one between 10 and 1000 MeV. 01 and 5 MeV. These neutrons could also cause transient faults. Further, thermal neutrons may also arise in semiconductor processes that use the boron-10 isotope. 26 CHAPTER 1 Introduction of New York City, although its GR is eight times higher than that of New York City. The JEDEC standard [13] describes how to map a given terrestrial site to its GR and compute the corresponding neutron flux at that location.

6). Often, these metal atoms from the voided region create an extruding bulge on the metal line itself. EM is caused by electron flow and exacerbated by rise in temperature. As electrons move through metal lines, they collide with the metal atoms. If these collisions transfer sufficient momentum to the metal atoms, then these atoms may get displaced in the direction of the electron flow. The depleted region becomes the void, and the region accumulating these atoms forms the extrusion. Black’s law is commonly used to predict the MeTTF of a group of aluminum interconnects.

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Architecture Design for Soft Errors by Shubu Mukherjee


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